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Composition, properties, and uses of HEDP · Na2 hydroxyethylidenediphosphonic acid disodium salt

Posted on September 15, 2023 By admin No Comments on Composition, properties, and uses of HEDP · Na2 hydroxyethylidenediphosphonic acid disodium salt

HEDP · Na2 (Hydroxyethylene Disodium Phosphonate) is a chemical substance with various characteristics and uses. The following is an explanation of the composition, properties, and uses of HEDP · Na2:

Composition: The chemical name of HEDP · Na2 is disodium hydroxyethylenediphosphonate, and the chemical formula is C2H6O7P2Na2. It is a compound formed by hydroxyethylidene diphosphonic acid (HEDP) and sodium salt.

Performance:

Excellent chelating performance: HEDP · Na2 has good chelating effect and can form stable complexes with metal ions, inhibiting metal ion catalyzed reactions and sediment generation.

Heat resistance: HEDP · Na2 remains stable at high temperatures and is not easily decomposed, making it suitable for high-temperature environments.

Stable under alkaline conditions: HEDP · Na2 remains stable under alkaline conditions and can be used for treatment in alkaline environments.

Solubility: HEDP · Na2 is easily soluble in water, forming a stable aqueous solution.

Purpose:

Water treatment agent: HEDP · Na2 is commonly used as a water treatment agent in boiler water, industrial circulating water, and water supply systems. It can chelate metal ions, prevent calcium scale, and metal corrosion.

Etchant: HEDP · Na2 is widely used as a metal etchant in the electronic industry, used in the manufacturing process of printed circuit boards and other electronic devices.

Cleaning agent: Due to its excellent complexing performance and anti scaling ability, HEDP · Na2 can also be used as a cleaning agent to remove iron scale, calcium scale, and other dirt on the surface of pipelines, equipment, etc.

It should be noted that the specific usage method and dosage should be adjusted according to the actual situation, and relevant safety operating procedures should be followed during use.

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